Product Details
Place of Origin: China
Brand Name: AFK
Certification: CE
Model Number: CV
Payment & Shipping Terms
Minimum Order Quantity: 1
Price: Negotiable
Packaging Details: Expotrt Packing
Delivery Time: 1WEEK
Payment Terms: L/C, D/A, D/P, T/T, Western Union, MoneyGram, MoneyGram
Supply Ability: 5000PC
Application: |
General |
Material: |
Stainless Steel |
Pressure: |
High Pressure |
Temperature Of Media: |
Medium Temperature,Normal Temperature,Low Temperature |
Media: |
Gas,Air |
Port Size: |
Standard |
Standard Or Nonstandard: |
Standard |
Warranty: |
1 Year |
Application: |
General |
Material: |
Stainless Steel |
Pressure: |
High Pressure |
Temperature Of Media: |
Medium Temperature,Normal Temperature,Low Temperature |
Media: |
Gas,Air |
Port Size: |
Standard |
Standard Or Nonstandard: |
Standard |
Warranty: |
1 Year |
Gas filter
The gas filter used in high purity gas system is a device to filter out the particles in the gas according to the collision, diffusion and interception mechanism. With the development of integrated circuit to megabit level, more strict requirements are put forward for ultra clean. According to semi standard, 2011lm particles in 10011 grade nitrogen and argon supplied by pipeline are less than 014 L; The number of particles > 011lm in 16mdram gas is less than 1 L. In ultra-high purity gas or electronic gas supply system, in order to remove the falling particles caused by vibration or airflow impact, filters should be installed downstream of valves and fittings and before using gas. The selection and specification of particle filter depends on the gas control specification. The shell of the filter is made of 316 stainless steel. The filter element has sintered porous metal filter element, corrosion-resistant and heat-resistant nickel base alloy, 100% nickel alloy, aluminum ceramic, Teflo |
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Product features
Wide range of applications, flow range from 15 to 300SL / min It is compatible with most high purity semiconductor process gases. 3 nanoparticle filtration capacity to maintain high flow efficiency, ultra-small pressure drop. 5Ra electropolished surface can prevent internal pollution. After cleaning with deionized water, it is baked with hot nitrogen to meet the semiconductor process standard. One million dust-free aseptic workshop manufacturing, cleaning and packaging environment. Test 100% helium leakage. |
Product performance parameters
Filtration accuracy | ≥0.0025μm | |
filtration efficiency | Removal rate99.99999%≥0.0025μm | |
rated flow | 15L/Min | |
60L/Min | ||
120/Min | ||
200Min | ||
300Min | ||
filter composition | Filter element | 316/PTFE |
shell | stainless steel316L | |
working conditions | inlet maximum pressure | 21Mpa(310kgf/cm2) |
maximum differential pressure | 15Mpa(153kgf/cm2) | |
maximum working temperature | 430℃(Inert gas) | |
helium leakage rate | 1x10-9atm cc/sec | |
surface finish | ≤Ra 5μm |
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